Development of Cold Plasma Technologies for Surface Decontamination of Seed Fungal Pathogens: Present Status and Perspectives

冷等离子体技术在种子表面真菌病原体消毒中的应用:现状与展望

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Abstract

In view of the ever-growing human population and global environmental crisis, new technologies are emerging in all fields of our life. In the last two decades, the development of cold plasma (CP) technology has offered a promising and environmentally friendly solution for addressing global food security problems. Besides many positive effects, such as promoting seed germination, plant growth, and development, CP can also serve as a surface sterilizing agent. It can be considered a method for decontamination of microorganisms on the seed surface alternative to the traditional use of fungicides. This review covers basics of CP technology and its application in seed decontamination. As this is a relatively young field of research, the data are scarce and hard to compare due to various plasma setups and parameters. On the other hand, the rapidly growing research field offers opportunities for novel findings and applications.

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