Formation of Nanostructure during Replication of a Hierarchical Plant Surface

层级植物表面复制过程中纳米结构的形成

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Abstract

Plant and animal surfaces have become a model for preparing special synthetic surfaces with low wettability, reflectivity, or antibacterial properties. Processes that lead to the creation of replicas of natural character use two-step imprinting methods. This article describes a technique of synthetic polymer surface preparation by the process of two-stage imprinting. The laboratory-prepared structure copies the original natural pattern at the micrometer and sub-micrometer levels, supplemented by a new substructure. The new substructure identified by the scanning electron microscope is created at the nanometer level during the technological process. The nanostructure is formed only under the conditions that a hierarchical structure forms the surface of the natural replicated pattern, the replication mold is from a soft elastomeric material, and the material for producing the synthetic surface is a polymer capable of crystallizing. A new nanometer substructure formation occurs when the polymer cools to standard laboratory temperature and atmospheric pressure.

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