Abstract
The plasma-surface interface has sparked interest due to its potential of creating alternative reaction pathways not available in typical gas-surface reactions. Currently, there are a limited number of in situ studies investigating the plasma-surface interface, restricting the development of its application. Here, we report the use of in situ ambient pressure X-ray photoelectron spectroscopy in tandem with an optical spectrometer to characterize the hydrogen plasma's interaction with metal surfaces. Our results demonstrate the possibility to monitor changes on the metal foil surface in situ in a plasma environment. We observed an intermediate state from the metal oxide to an -OH species during the plasma environment, indicative of reactive hydrogen radicals at room temperature. Furthermore, the formation of metal-carbides in the hydrogen plasma environment was detected, a characteristic absent in gas and vacuum environments. These findings illustrate the significance of performing in situ investigations of the plasma-surface interface to better understand and utilize its ability to create reactive environments at low temperature.