Preparation and Foam Stabilization Mechanism of an Ultrahigh-Temperature Colloidal Gas Aphron (CGA) System Based on Nano-SiO(2)

基于纳米SiO(2)的超高温胶体气体Aphron (CGA)系统的制备及泡沫稳定机理

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Abstract

Recently, colloidal gas aphron (CGA) drilling fluids have successfully solved the problem of drilling low-pressure depleted oil and gas reservoirs. However, with the increase in the drilling depth and the development of geothermal resources, high-temperature stable CGA drilling fluids need to be developed urgently. This research reports a highly stable nano-SiO(2)-based CGA system with a temperature resistance of 200 °C. Waring-Blender tests show that 1.5-3% nano-SiO(2) greatly improves the high-temperature stability of the CGA system, and the half-life of foam aged at 120-200 °C can reach 6-12 h. Also, the nano-SiO(2)-based CGA system aged at 200 °C can maintain an independent and stable morphology during the observation period (60 min), and there is no obvious drainage and merger in the system. The stabilizing mechanism of nano-SiO(2) has been revealed, which can be summarized as the comprehensive effect of adsorption, viscosity increase, and cross-linking. In other words, the addition of nano-SiO(2) enhanced steric hindrance and liquid film strength by reducing the surface tension, increasing fluid viscosity, and forming a network-like structure.

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