Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition.

Previous work demonstrates that scalable area-selective deposition of van der Waals monolayers enables tunable design of atomically thin electronic and photonic platforms. Here, we present a protocol for lateral patterning of MoS(2)-WS(2) heterostructures using sequential chemical vapor deposition. We describe steps for constructing patterned lateral heterostructures with alternating channels from nanometers to micrometers. This protocol has potential application in next-generation atomically thin electronic circuits. For complete details on the use and execution of this protocol, please refer to Lee et al.(1).