Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film

基于石墨烯纳米片嵌入碳(GNEC)薄膜的超疏水、光消毒、可重复使用口罩

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Abstract

The 2019 coronavirus disease (COVID-19) has affected more than 200 countries. Wearing masks can effectively cut off the virus spreading route since the coronavirus is mainly spreading by respiratory droplets. However, the common surgical masks cannot be reused, resulting in the increasing economic and resource consumption around the world. Herein, we report a superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film, with high-density edges of standing structured graphene nanosheets. The GNEC mask exhibits an excellent hydrophobic ability (water contact angle: 157.9°) and an outstanding filtration efficiency with 100% bacterial filtration efficiency (BFE). In addition, the GNEC mask shows the prominent photo-sterilize performance, heating up to 110 °C quickly under the solar illumination. These high performances may facilitate the combat against the COVID-19 outbreaks, while the reusable masks help reducing the economic and resource consumption. ELECTRONIC SUPPLEMENTARY MATERIAL: Supplementary material (further details of electron cyclotron resonance (ECR) sputtering system, deposition of GNEC film, fabrication of GNEC mask, and characterization of the GNEC mask) is available in the online version of this article at 10.1007/s12274-020-3158-1.

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