Abstract
Zinc antimonides have been widely studied owing to their outstanding thermoelectric properties. Unlike in the bulk state, where various structurally unknown phases have been identified through their specific physical properties, a number of intermediate phases in the thin-film state remain largely unexplored. Here, in situ X-ray diffraction and X-ray total scattering are combined with in situ measurement of electrical resistivity to monitor the crystallization process of as-deposited amorphous Zn-Sb films during post-deposition annealing. The as-deposited Zn-Sb films undergo a structural evolution from an amorphous phase to an intermediate crystalline phase and finally the ZnSb phase during heat treatment up to 573 K. An intermediate phase (phase B) is identified to be a modified β-Zn(8)Sb(7) phase by refinement of the X-ray diffraction data. Within a certain range of Sb content (∼42-55 at%) in the films, phase B is accompanied by an emerging Sb impurity phase. Lower Sb content leads to smaller amounts of Sb impurity and the formation of phase B at lower temperatures, and phase B is stable at room temperature if the annealing temperature is controlled. Pair distribution function analysis of the amorphous phase shows local ordered units of distorted ZnSb(4) tetrahedra, and annealing leads to long-range ordering of these units to form the intermediate phase. A higher formation energy is required when the intermediate phase evolves into the ZnSb phase with a significantly more regular arrangement of ZnSb(4) tetrahedra.