Marginal Integrity of Simplified Adhesive Strategies in Primary Teeth

简化粘接策略在乳牙中的边缘完整性

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Abstract

OBJECTIVE: The aim of this research was to investigate the effect of simplified adhesive strategies (self-etch vs selective enamel etch and 10- vs 20-second adhesive application time) on the marginal integrity in primary molars. METHODS: Forty deep class-II cavities were prepared in 40 extracted primary molars. The molars were divided into 4 groups based on the applied universal adhesive strategy as follows: groups 1 and 2: selective enamel etch with 20- or 10-second application time and groups 3 and 4: self-etch with 20- or 10-second application time. All cavities were restored with a sculptable bulk-fill composite restoration. The restorations underwent a thermomechanical loading (TML, 5-50 °C, 2-minute dwelling time, ×1000; 400,000 loading cycles, 1.7 Hz, 49 N). Marginal analysis before and after TML was conducted with scanning electron microscopy and the marginal integrity of each restoration was calculated as a percentage of continuous margins. A beta regression model was adopted to statistically analyse the data with a consequent pairwise comparison. RESULTS: The mean marginal integrity (% ± SD) of the restorations for each tested adhesive strategy after TML was as follows: selective enamel etch/20 seconds = 85.4 ± 3.9, self-etch/20 seconds = 85.3 ± 5.2, self-etch/10 seconds = 80.1 ± 8.2, and selective enamel etch/10 seconds = 80.0 ± 8.5. The difference between both adhesive strategies was not statistically significant at the same application time. The difference between both application times within the same adhesive strategy was statistically significant (P ≤ .01). CONCLUSIONS: Universal adhesives applied either in selective enamel etch or in self-etch mode result in comparable marginal integrities when restoring class-II cavities in primary molars. Shortened adhesive application time (10 seconds) could lead to a reduction in the marginal integrity in comparison to the recommended application time of 20 seconds.

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