Iatrogenic ventricular septal defect after transcatheter aortic valve implantation: a rare complication

经导管主动脉瓣置换术后医源性室间隔缺损:一种罕见并发症

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Abstract

Iatrogenic ventricular septal defect (VSD) is a rare complication following transcatheter aortic valve implantation (TAVI). An 83-year-old male underwent TAVI for severe aortic stenosis (AS) and was diagnosed with a peri-membranous VSD on echocardiography, which was not evident on pre-procedural imaging. This case highlights the risk factors, symptoms, diagnosis, and management of iatrogenic VSD following TAVI.

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