Abstract
The current state-of-the-art in the growth, structure, and physicochemical properties of iron nitride thin films is presented. First, different iron nitride phases are introduced based on their crystallographic structure and the Fe-N phase diagram. Second, preparation methods for thin iron nitride films are described. Next, the structure, electronic, and magnetic properties of the films are discussed. Finally, potential applications of iron nitride films, as well as the challenges to be faced in the field, are highlighted. This Review constitutes a starting point for anyone who would like to conduct research on these fascinating materials, the scientific and technological potential of which has not been fully explored to date.