Abstract
Using a pump-probe technique, the reflectivity of a silicon grating surface irradiated with intense femtosecond (fs) laser pulses was measured as a function of the incidence angle and the delay time between pulses. After irradiating the surface with an intense s-polarized, 400 nm, 300 fs laser pulse, the reflectivity measured with a weak p-polarized, 800 nm, 100 fs laser pulse exhibited an abrupt decrease for an incidence angle of ~ 24°. The depth of the dip was greatest for a delay time of 0.6-10 ps, for which the reflectivity around the dip was highest. The surface was also found to be ablated most strongly for the conditions causing the deepest dip for a delay time of 5-10 ps. Surface plasmon polaritons (SPPs) on silicon metallized by the intense pulse are resonantly excited by the subsequent pulse, and the strong coherent coupling between the subsequent pulse and SPPs excited on the molten Si surface produced by high-density free electrons induces strong surface ablation due to the intense plasmonic near-field. The results clearly show that fs pulses can be used to significantly modulate the nature of nonmetallic materials and could possibly serve as a basic tool for the excitation of SPPs on nonmetallic materials using ultrafast laser-matter interactions.