Library of single-etch silicon nitride grating couplers for low-loss and fabrication-robust fiber-chip interconnection

用于低损耗和制造工艺稳健的光纤芯片互连的单蚀刻氮化硅光栅耦合器库

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Abstract

Silicon nitride (Si(3)N(4)) waveguides become an appealing choice to realize complex photonic integrated circuits for applications in telecom/datacom transceivers, sensing, and quantum information sciences. However, compared to high-index-contrast silicon-on-insulator platform, the index difference between the Si(3)N(4) waveguide core and its claddings is more moderate, which adversely affects the development of vertical grating-coupled optical interfaces. Si(3)N(4) grating couplers suffer from the reduced strength, therefore it is more challenging to radiate all the waveguide power out of the grating within a beam size that is comparable to the mode field diameter of standard optical fibers. In this work, we present, by design and experiments, a library of low-loss and fabrication-tolerant surface grating couplers, operating at 1.55 μm wavelength range and standard SMF-28 fiber. Our designs are fabricated on 400 nm Si(3)N(4) platform using single-etch fabrication and foundry-compatible low-pressure chemical vapor deposition wafers. Experimentally, the peak coupling loss of - 4.4 dB and - 3.9 dB are measured for uniform couplers, while apodized grating couplers yield fiber-chip coupling loss of - 2.9 dB, without the use of bottom mirrors, additional overlays, and multi-layered grating arrangements. Beside the single-hero demonstrations, over 130 grating couplers were realized and tested, showing an excellent agreement with finite difference time domain designs and fabrication-robust performance. Demonstrated grating couplers are promising for Si(3)N(4) photonic chip prototyping by using standard optical fibers, leveraging low-cost and foundry-compatible fabrication technologies, essential for stable and reproducible large-volume device development.

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