Abstract
The photodeposition of metallic nanostructures onto ferroelectric surfaces could enable new applications based on the assembly of molecules and patterning local surface reactivity by enhancing surface field intensity. DCJTB (4-(dicyanomethylene)-2-t-butyl-6-(1,1,7,7-tetramethyljulolidyl-9-enyl)-4H-pyran) is an excellent fluorescent dye and dopant material with a high quantum efficiency used for OLED displays on the market. However, how to raise the photoluminescence (PL) and reduce the lifetime of DCJTB in a substrate remain extraordinary challenges for its application. Here, we demonstrate a tunable ferroelectric lithography plasmon-enhanced substrate to generate photo-reduced silver nanoparticles (AgNPs) and achieve enhanced PL with a shortened lifetime depending on the substrate's annealing time. The enhanced PL with shortened lifetimes can attribute to the localized electromagnetic (EM) wave produced by the nanotextured AgNPs layers' surface and gap plasmon resonances. The simulation is based on the three-dimensional finite element method to explain the mechanism of experimental results. Since the absorption increases, the remarkable enhanced PL of DCJTB can attain in the fabricated periodically proton exchanged (PPE) lithium niobate (LiNbO(3)) substrate. Furthermore, the proposed fabrication method demonstrates to help tune the surface EM wave distribution in the substrate, which can simultaneously achieve the significantly shortened lifetime and high PL intensity of DCJTB in the substrate. Compared with the un-annealed substrate, the PL intensity of DCJTB in the assembly metallic nanostructures is enhanced 13.70 times, and the PL's lifetime is reduced by 12.50%, respectively. Thus, the fabricated substrate can be a promising candidate, verifying chemically patterned ferroelectrics' satisfaction as a PL-active substrate.