Abstract
Silicon-germanium (Si-Ge) avalanche photodiodes (APDs), fully compatible with complementary metal-oxide-semiconductor (CMOS) processes, are critical devices for high-speed optical communication. In this work, we propose a three-terminal Si-Ge APD on a silicon-on-insulator (SOI) substrate based on device simulation studies. The proposed APD employs a separate absorption and multiplication structure, achieving an ultra-low breakdown voltage of 6.8 V. The device operates in the O-band, with optical signals laterally coupled into the Ge absorption layer via a silicon nitride (Si(3)N(4)) waveguide. At a bias of 2 V, the APD exhibits a responsivity of 0.85 A/W; under a bias of 6.6 V, it achieves a 3-dB optoelectronic (OE) bandwidth of 51 GHz, a direct current gain of 27, and a maximum gain-bandwidth product (GBP) of 1377 GHz. High-speed performance is further confirmed through eye-diagram simulations at 100 Gbps non-return-to-zero (NRZ) and 200 Gbps four-level pulse amplitude modulation (PAM4). These results clearly show the strong potential of the proposed APD for optical communication and interconnect applications under stringent power and supply voltage constraints.