Evolution of the Internal Structure of Short-Period Cr/V Multilayers with Different Vanadium Layers Thicknesses

不同钒层厚度的短周期Cr/V多层膜内部结构的演变

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Abstract

Cr/V multilayer mirrors are suitable for applications in the "water window" spectral ranges. To study factors influencing the internal microstructure of Cr/V multilayers, multilayers with different vanadium layers thicknesses varying from 0.6 nm to 4.0 nm, and a fixed thickness (1.3 nm) of chromium layers, were fabricated and characterized with a set of experimental techniques. The average interface width characterizing a cumulative effect of different structure irregularities was demonstrated to exhibit non-monotonous dependence on the V layer thickness and achieve a minimal value of 0.31 nm when the thickness of the V layers was 1.2 nm. The discontinuous growth of very thin V films increased in roughness as the thickness of V layers decreased. The columnar growth of the polycrystalline grains in both materials became more pronounced with increasing thickness, resulting in a continuous increase in the interface width to a maximum of 0.9 nm for a 4 nm thickness of the V layer.

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