Abstract
The optical response of properly excited periodically arranged plasmonic nanostructures is known to demonstrate sharp resonance features associated with high-Q collective modes demanding for various applications in light-matter interaction, filtering and sensing. Meanwhile, practical realization and replication of plasmonic platforms supporting high-Q modes via scalable inexpensive lithography-free approach is still challenging. Here, we justify direct ablation-free irradiation of Si-supported thin Au film by nanojoule-energy femtosecond laser pulses as a single-step and scalable technology for realization of plasmonic metasurfaces supporting collective plasmonic response. Using an adjustable aperture to control and upscale the size of the fabricated nanostructures, nanobumps and nanojets, we demonstrated plasmonic metasurface supporting collective resonances with a moderately high Q-factor (up to 17) and amplitude (up to 45%) within expanded spectral range (1.4-4.5 µm). Vacuum deposition of thin films above the as-fabricated nanostructure arrays was demonstrated to provide fine tuning of the resonance position, also expanding the choice of available materials for realization of plasmonic designs with extended functionality.