Potential-Dependent Kinetics and Reaction Pathways of Low-Potential Furfural Electrooxidation with Anodic H(2) Production

低电位糠醛电氧化反应及其阳极产氢反应的电位依赖性动力学和反应路径

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Abstract

The low-potential furfural electrooxidation reaction (FFOR) on copper-based catalysts provides a novel pathway to upgrade biomass and produce H(2) simultaneously on anode. Herein, a series of oxide-derived copper catalysts (OD-Cu-x, x represents electroreduction time) with distinct Cu(0)/Cu(+) ratios and residual content of lattice oxygen are successfully constructed by tuning in-situ electroreduction time. When applied for FFOR, the OD-Cu-600 with a Cu(0)/Cu(+) ratio of 83.3% shows the Faradaic efficiency of 96.1% for furoic acid (FA) and 97.4% for H(2), which can be achieved at a lowest potential of 0.081 V versus RHE at 10 mA cm(-2) in continuous 10 cycles, outperforming the state-of-art Cu-based catalysts reported so far. Detailed characterization and density functional theory (DFT) calculations prove that the moderate coverage (25% based on DFT models) of Cu(OH)(ads) surface species generated by Cu(+) during the electrooxidation process endows the optimal furfural molecule adsorption and activation. Moreover, this potential-dependent coverage of surface OH can promote the kinetics of *H transfer to the Cu surface, allowing the H(2) evolution from the anode. The Cu(0)/Cu(+) ratio (83.8%) and suitable applied potential windows (0 to 0.4 V vs RHE) are both responsible for the co-production of FA and H(2) with high intrinsic activity and efficient H atom utilization.

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