Measuring the Bandgap of Ambipolar 2D Semiconductors using Multilayer Graphene Contact

利用多层石墨烯接触测量双极性二维半导体的带隙

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Abstract

The bandgaps of monolayers and few layers in 2D semiconductors are usually measured by optical probing such as photoluminescence (PL). However, if their exfoliated thickness is as large as a few nanometers (multilayer over ≈5 L), PL measurements become less effective and inaccurate because the optical transition of a 2D semiconductor often changes from direct to indirect mode. Herein, a simple method to approximately estimate the bandgap of multilayer 2D van der Waals (vdW) semiconductors is introduced; that is utilizing a field-effect transistor (FET) as a platform. Multilayer graphene (multi-LG) contact for multilayer van der Waals channels in the FET is used, because multi-LG contact would secure ambipolar behavior and somewhat enable Schottky barrier modulation in contact with vdW channels. As a result, the bandgaps of multilayer transition-metal dichalcogenides (TMDs) and black phosphorus in unknown thicknesses are approximated through measuring the temperature-dependent transfer curve characteristics. The bandgaps are confirmed with photoelectric responsivity measurements, which evidences the validity of the multi-LG-induced approximation.

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