Effect of fluorine tin oxide substrate on the deposited SnO(2): Ni thin films properties for gas sensing

氟锡氧化物衬底对沉积的SnO₂:Ni薄膜气体传感性能的影响

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Abstract

This study explores the deposition of Tin Oxide and Ni-doped SnO(2) thin films (NSO) via spray pyrolysis from aqueous solutions. The deposition process was conducted under uniform conditions on two substrates, namely glass and fluorine tin oxide (FTO), with varying Ni percentages. The aim was to evaluate their potential for gas sensing applications. The as-deposited thin films exhibit diverse properties influenced by both Ni content and substrate type. X-Ray Diffraction (XRD) measurements reveal polycrystalline structures characterized by broad SnO(2) diffraction lines, with the emergence of a NiO phase, particularly evident at higher Ni content. Notably, thin films deposited on FTO show the appearance of a secondary phase of SnO and enhanced crystallinity. Furthermore, lattice parameters and crystallite size decrease with increasing Ni percentage. The Field Emission Scanning Electron Microscopy (FE-SEM) analysis highlights significant alterations in surface nanostructures based on nickel content and substrate type. Higher nickel concentrations result in the formation of cauliflower-like structures, varying in size and density. This structural divergence significantly impacts the sensitivity of NSO-based NO(2) gas sensors. Particularly, thin films with 20 % Ni, especially those deposited on FTO, exhibit optimal configurations for gas sensor applications, display sensitivity of 501 % at 100 ppm for nanocrystalline NSO/FTO compared to 436 % for glass-deposited samples. Our findings highlight the crucial role of Ni content and substrate type in modifying the structural and sensing properties of NSO thin films, for enhanced gas sensing applications.

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