Abstract
Nano-transfer printing (nTP) has emerged as an effective method for fabricating three-dimensional (3D) nanopatterns on both flat and non-planar substrates. However, most transfer-printed 3D patterns tend to exhibit non-discrete and/or non-porous structures, limiting their application in high-precision nanofabrication. In this study, we introduce a simple and versatile approach to produce highly ordered, porous 3D cross-bar arrays through precise control of the nTP process parameters. By selectively adjusting the polymer solution concentration and spin-coating conditions, we successfully generated discrete, periodic line patterns, which were then stacked at a 90-degree angle to form a porous 3D cross-bar structure. This technique enabled the direct transfer printing of PMMA line patterns with well-defined, square-arrayed holes, without requiring additional deposition of functional materials. This method was applied across diverse substrates, including planar Si wafers, flexible PET, metallic copper foil, and transparent glass, demonstrating its adaptability. These well-defined 3D cross-bar patterns enhance the versatility of nTP and are anticipated to find broad applicability in various nano-to-microscale electronic devices, offering high surface area and structural precision to support enhanced functionality and performance.