Atomic Layer Processes for UV-Stable Polymers: Synergistic Effects of Infiltration and Deposition of ZnO

用于紫外稳定聚合物的原子层工艺:ZnO浸渗和沉积的协同效应

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Abstract

Ultraviolet (UV) radiation is the major cause of polymer degradation in outdoor environments, accelerating mechanical failure and color change, leading to plastic waste accumulation. Effective UV-protective strategies that preserve polymer functionality are therefore critical for extending material longevity in UV-intense environments. Here, we present a synergistic approach combining vapor phase infiltration (VPI) and atomic layer deposition (ALD) to engineer nanoscale zinc oxide (ZnO) coatings on poly(lactic acid) (PLA), a UV-sensitive polymer. Individually, ALD and VPI offer minimal enhancement in UV stability; however, their sequential application enables the formation of conformal, polycrystalline ZnO films that dramatically improve UV resistance in both 3D-printed structures and thin-film PLA models. In situ microgravimetry and cross-sectional electron microscopy reveal that VPI introduces ZnO nucleation sites within and atop the polymer matrix, promoting a >10-fold increase in ZnO growth per ALD cycle. The resulting ZnO-PLA hybrids absorb over 90% of incident UV-C radiation while maintaining high optical transparency in the visible range. This low-temperature, scalable process provides a promising platform for the development of transparent, durable UV-barrier coatings on polymers for use in environmentally demanding applications.

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