Abstract
Halogenated metal phthalocyanines are promising materials for the manufacture of active layers of chemiresistive sensors for the detection of various gases. Despite the high interest in such sensors, there are few systematic studies of the position of halogen substituents in phthalocyanine macroring on the chemiresistive response of their films to gases. In this work, we prepared and studied films of novel tetrachlorosubstituted vanadyl phthalocyanine derivatives with Cl substituents in the peripheral (VOPcCl(4)-p) and nonperipheral (VOPcCl(4)-np) positions of the phthalocyanine ring as active layers of chemiresistive sensors to reveal the effect of the position of substituents on their structure and sensor response to low concentrations of NH(3). It was shown that the films of VOPcCl(4)-p exhibited a noticeably higher sensor response to NH(3) than the VOPcCl(4)-np ones. The limit of detection of NH(3) was 0.7 ppm. The sensing layers demonstrated a reversible sensor response at room temperature with fairly low response/recovery times. It was also demonstrated that NH(3) can be detected in the presence of various interfering gases (CO(2) and H(2)) and some volatile organic vapors, as well as in a mixture of gases with a composition close to exhaled air.