Abstract
Magnetoelastic micro-electromechanical systems (MEMS) are integral elements of sensors, actuators, and other devices utilizing magnetostriction for their functionality. Their sensitivity typically scales with the saturation magnetostriction and inversely with magnetic anisotropy. However, large saturation magnetostriction and small magnetic anisotropy make the magnetoelastic layer highly susceptible to minuscule anisotropic stress. It is inevitably introduced during the release of the mechanical structure during fabrication and severely impairs the device's reproducibility, performance, and yield. To avoid the transfer of residual stress to the magnetic layer, we use a shadow mask deposition technology. It is combined with a free-free magnetoelectric microresonator design to minimize the influence of magnetic inhomogeneity on device performance. Magnetoelectric resonators are experimentally and theoretically analyzed regarding local stress anisotropy, magnetic anisotropy, and the ΔE-effect sensitivity in several resonance modes. The results demonstrate an exceptionally small device-to-device variation of the resonance frequency < 0.2% with large sensitivities comparable with macroscopic ΔE-effect magnetic field sensors. This development marks a promising step towards highly reproducible magnetoelastic devices and the feasibility of large-scale, integrated arrays.