Overlooked Photochemical Risk of Antimicrobial Fragrances: Formation of Potent Allergens and Their Mechanistic Pathways

抗菌香料被忽视的光化学风险:强效过敏原的形成及其作用机制

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Abstract

Antimicrobial fragrances, commonly found in household and personal care products, are frequently detected in water bodies, yet their environmental fate and transformation mechanisms remain inadequately explored. This study investigates the photochemical transformation of cinnamaldehyde (CA), a representative antimicrobial fragrance, and its consequence for toxicological effects. The results showed that under UV irradiation, 94.6% CA was eliminated within 60 min, with a degradation rate of 0.059 min(-1). Laser flash photolysis, quenching experiments, and electron paramagnetic resonance spectra identified O(2)(•-) and (3)CA(*) as the important species, contributing 29.4% and 33.6%, respectively, to the transformation process. Additionally, singlet oxygen ((1)O(2)), hydroxyl radicals ((•)OH), and solvated electrons (e(aq)(-)) were involved in mediating the oxidation reactions. These species facilitated photoionization and oxidation, resulting in the formation of five major transformation products, including cis-cinnamyl aldehyde, cinnamic acid, styrene, 1aH-indeno [1,2-b]oxirene), and 1-Oxo-1H-indene. Most of these products were persistent, and exhibited considerable ecotoxicological risks. Specifically, the cinnamic acid and 1-Oxo-1H-indene caused severe skin irritation, while cinnamic acid induced significant eye irritation. Notably, the transformation products demonstrated sensitizing effects on human skin. This study underscores the overlooked ecotoxicological risks associated with the photochemical transformation of antimicrobial fragrances, revealing their potential to generate potent allergens and other harmful byproducts.

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