Growth of a Large, Single-Crystalline WS(2) Monolayer for High-Performance Photodetectors by Chemical Vapor Deposition

利用化学气相沉积法生长大面积单晶WS(2)单层,用于高性能光电探测器

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Abstract

2D WS(2) is a promising candidate for the next generation nanoelectronics, spintronics, valleytronics, and optoelectronics. However, the uncontrollably large-area growth of WS(2) nanosheets and their unsatisfactory performance of the photodetectors based on WS(2) hindered its applications. Here, we proposed a CVD method using tungstic acid as the precursors to grow WS(2) flakes. After being characterized by AFM, Raman, PL, and TEM, we found the as-grown WS(2) flakes were high-quality structures. Then the photodetectors based on the as-grown WS(2) were fabricated, which exhibited high responsivity (7.3 A W(-)(1)), a fast response rate (a response time of 5 ms and a recovery time of 7 ms), prefect external quantum efficiency (EQE) (1814%), and remarkable detectivity (D*) (3.4 × 10(12) Jones). Our works provided a new CVD method to grow some high-quality WS(2) nanosheets.

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