Photoelectrochemical Imaging of Charge Separation between MoS(2) Triangles and Insulating SiO(2) Support

利用光电化学成像技术研究 MoS₂ 三角形与绝缘 SiO₂ 载体之间的电荷分离

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Abstract

The role of the insulating support in photocatalysis is poorly understood. Using high-resolution photo-scanning electrochemical microscopy (photo-SECM), we observed significant spatial charge separation in few-layer-thick molybdenum disulfide (MoS(2)) triangles attached to a SiO(2) substrate. Spatially resolved surface photovoltage (SPV) measurements revealed that photogenerated holes migrate from MoS(2) to the SiO(2) surface and travel laterally over distances exceeding 2 μm, driven by the built-in electric field of ∼1.7 kV/cm. In thicker and less uniform flakes, the charge separation is dominated by internal driving forces within MoS(2), without significant contribution from SiO(2). These findings underscore the importance of insulator-semiconductor interactions for effective charge separation, suggesting a new strategy for optimizing photocatalytic systems.

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