Flow around topological defects in active nematic films

活性向列相薄膜中拓扑缺陷周围的流动

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Abstract

We study the active flow around isolated defects and the self-propulsion velocity of + 1/2 defects in an active nematic film with both viscous dissipation (with viscosity η ) and frictional damping Γ with a substrate. The interplay between these two dissipation mechanisms is controlled by the hydrodynamic dissipation length [Formula: see text] that screens the flows. For an isolated defect, in the absence of screening from other defects, the size of the shear vorticity around the defect is controlled by the system size R . In the presence of friction that leads to a finite value of ℓd , the vorticity field decays to zero on the lengthscales larger than ℓd . We show that the self-propulsion velocity of + 1/2 defects grows with R in small systems where R < ℓd , while in the infinite system limit or when R ≫ ℓd , it approaches a constant value determined by ℓd .

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