Abstract
This paper demonstrates a method to fabricate plasmonic nanostructures over a large area that can be implemented as SERS substrates. The proposed method comprises batch processes such as spin coating, reactive ion etching, and thin metal deposition. These processes can be performed on large wafers, resulting in large numbers of SERS substrates in a single run. The effects of different process parameters were studied to optimize the performance of the SERS substrates. The study of sensitivity on the optimized SERS substrates was conducted using the SERS-active molecule pMBA. The SERS substrates thus fabricated were able to detect molecule concentrations as low as 100 nM. The SERS substrates were also evaluated for uniformity across the sample and for sample-to-sample reproducibility. Finally, the SERS substrates were applied to demonstrate label-free detection of organophosphorous pesticides - paraoxon ethyl and paraoxon methyl.