Operando Characterization of Electrochemistry at the Rutile TiO(2)(110)/0.1 M HCl Interface Using Ambient Pressure XPS

利用常压XPS对金红石型TiO₂(110)/0.1 M HCl界面电化学进行原位表征

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Abstract

Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) was employed to investigate the effect of applied potential on the interface of TiO(2)(110) with 0.1 M HCl. The study, which involved operando electrochemical characterization, enabled real-time monitoring and analysis of electrochemical processes. There is a significant influence on the interface composition; in particular, the surface Cl(-) surface coverage varies with electrochemical potential. Moreover, there appears to be a reaction of evolved Cl with adventitious carbon to form C-Cl and C-Cl(2) species.

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