Distinct solvation patterns of OH(-) versus H(3)O(+) charge defects at electrified gold/water interfaces govern their properties

带电金/水界面上OH⁻和H₃O⁺电荷缺陷不同的溶剂化模式决定了它们的性质。

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Abstract

Understanding the solvation structures of OH(-) and H(3)O(+) at metal interfaces is crucial for developing efficient electrochemical devices. In this paper, we present a detailed investigation of the solvation structures of OH(-) and H(3)O(+) near gold electrodes under alkaline and acidic aqueous conditions, using ab initio molecular dynamics simulations at controlled surface charge density conditions. Our findings reveal that the adsorption tendencies of OH(-) and H(3)O(+) are strongly influenced by the oscillating net atomic charge of water normal to the electrified interface in concert with the distinct solvation patterns of these charge defects. While OH(-) preferentially adsorbs onto the gold surface within the first water layer, the positive net atomic charge restricts the closest approach of H(3)O(+) to beyond the first water layer. We unveil resting and active states that support charge transfer processes at the gold/water interface, which critically involve Au atoms in a unique Grotthuss-like mechanism.

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