Abstract
Free-standing gallium nitride has been prepared using various methods; however, the removal of the original substrate is still challenging with low success rates. In this work, 2-inch free-standing GaN films are obtained by direct growth on a fluoro phlogopite mica by hydride vapor-phase epitaxy. Depending on the van der Waals (vdW) interaction between GaN and mica, the effect of the significant lattice mismatch is effectively reduced; thus, enabling the production of a high-quality wafer-scale GaN film on mica. The vdW-induced cracks at GaN-mica interface are found to be initiated near the interface so that GaN can easily separate from mica during rapid cooling. Owing to the hydrophilic nature of mica, the residual GaN on the mica can be lifted off by following deionized water treatment, and the mica substrate can be repeatedly used to grow free-standing GaN films. The self-separated GaN films grown on both pristine and used mica substrates are single crystallinity and strain-free. Additionally, a fully functional ultraviolet light-emitting diode is demonstrated to show that the self-separated GaN films are of device quality. The proposed approach achieves epitaxial growth of wafer-scale single-crystalline GaN on 2D materials and provides a new substrate option in the technology of III-V materials.