Effect of Chemical Polishing on the Formation of TiO(2) Nanotube Arrays Using Ti Mesh as a Raw Material

化学抛光对以钛网为原料制备TiO₂纳米管阵列的影响

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Abstract

As a unique form of TiO(2), TiO(2) nanotube arrays (TiO(2)NTAs) have been widely used. TiO(2)NTAs are usually prepared by Ti foil, with little research reporting its preparation by Ti mesh. In this paper, TiO(2)NTAs are prepared on a Ti mesh surface via an anodic oxidation method in the F-containing electrolyte. The optimal parameters for the synthesis of TiO(2)NTAs are as follows: the solvent is ethylene glycol and water; the electrolyte is NH(4)F (0.175 mol/L); the voltage is 20 V; and the anodic oxidation time is 40 min without chemical polishing. However, there is a strange phenomenon where the nanotube arrays grow only at the intersection of Ti wires, which may be caused by chemical polishing, and the other areas, where TiO(2)NTAs cannot be observed on the surface of Ti mesh, are covered by a dense TiO(2) film. New impurities (the hydrate of TiO(2) or other products) introduced by chemical polishing and attaching to the surface of the Ti mesh reduce the current of anodic oxidation and further inhibit the growth of TiO(2) nanotubes. Hence, under laboratory conditions, for commercially well-preserved Ti mesh, there is no necessity for chemical polishing. The formation of TiO(2)NTAs includes growth and crystallization processes. For the growth process, F(-) ions corrode the dense TiO(2) film on the surface of Ti mesh to form soluble complexes ([TiF(6)](2-)), and the tiny pores remain on the surface of Ti mesh. Given the basic photoelectrochemical measurements, TiO(2)NTAs without chemical polishing have better properties.

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