Abstract
This paper presents a theoretical investigation into how rotational motion influences the propagation of thermoelastic and optical waves within a hydrodynamic semiconductor medium. Using the normal mode technique, the study explores the dynamic coupling among thermal, optical, and mechanical fields under rotational effects. The governing photo-thermoelastic equations are formulated to describe the interaction of temperature, stress, carrier density, and pore pressure within the semiconductor, incorporating hydrodynamic and poroelastic behaviors. The medium is modeled as homogeneous and isotropic, subjected to combined optical and acoustic excitations under specific boundary constraints. By applying a two-dimensional, dimensionless normal mode formulation, the coupled field equations are solved to determine the variations in displacement, temperature, stress, and carrier concentration. The numerical outcomes are displayed graphically, demonstrating how the characteristics of wave propagation are affected by rotational field strength and boundary conditions.