Abstract
Nanostructure engineering has proven to be one of the most effective strategies to improve the efficiency of photoelectric devices. Herein, we numerically investigate and experimentally demonstrate a self-assembled silicon-based nanopillars and nanoholes structures, to improve the light absorption of photoelectric devices by an antireflection enhancement. The nanopillars and nanoholes structures are fabricated by the air-liquid interface self-assembly method based on polystyrene (PS) nanospheres. Additionally, the tunable antireflective properties with the different operation wavelength and nanostructures parameters have been discussed based on the Finite-Difference Time-Domain (FDTD) method. The experimental result shows that the self-assembled silicon-based nanopillars and nanoholes structures can achieve the lowest reflectivity of 1.42% (nanopillars) and 5.83% (nanoholes) in the wavelength range of 250-800 nm, which reduced 95.97% and 84.83%, respectively, compared with the plane silicon. The operation mechanism of the tunable antireflective property of self-assembled nanopillars and nanoholes structures is also analyzed in the simulation. Our study suggests that the self-assembled nanopillars and nanoholes structures are potentially attractive as improving efficiency of photoelectric devices.