Abstract
Electrochemical advanced oxidation (EAO) systems are of significant interest due to their ability to treat a wide range of organic contaminants in water. Boron doped diamond (BDD) electrodes have found considerable use in EAO. Despite their popularity, no laboratory scale method exists to quantify anodic corrosion of BDD electrodes under EAO conditions; all are qualitative using techniques such as scanning electron microscopy, electrochemistry, and spectroscopy. In this work, we present a new method which can be used to quantify average corrosion rates as a function of solution composition, current density, and BDD material properties over relatively short time periods. The method uses white light interferometry (WLI), in conjunction with BDD electrodes integrated into a 3D-printed flow cell, to measure three-dimensional changes in the surface structure due to corrosion over a 72 h period. It is equally applicable to both thin film and thicker, freestanding BDD. A further advantage of WLI is that it lends itself to large area measurements; data are collected herein for 1 cm diameter disk electrodes. Using WLI, corrosion rates as low as 1 nm h-1 can be measured. This enables unequivocal demonstration that organics in the EAO solution are not a prerequisite for BDD anodic corrosion. However, they do increase the corrosion rates. In particular, we quantify that addition of 1 M acetic acid to 0.5 M potassium sulfate results in the average corrosion rate increasing ∼60 times. In the same solution, microcrystalline thin film BDD is also found to corrode ∼twice as fast compared to freestanding polished BDD, attributed to the presence of increased sp2 carbon content. This methodology also represents an important step forward in the prediction of BDD electrode lifetimes for a wide range of EAO applications.