Abstract
The deposition process of colloidal particles or microorganisms on flat surfaces is analyzed by means of computer simulations. Interparticle interactions (double layer and van der Waals) and weak gravitational forces are taken into account; hydrodynamic interactions, on the other hand, are neglected. In particular, the deposition probability as a function of the deposition location of a particle in the presence of one or two identical fixed particles is discussed. It is shown, in particular, that the ratio of the adhesion probabilities at a given location r, for particles subject to weak gravitation, in the presence and in the absence of the interparticle interaction U(r) follows approximately a Boltzmann law exp[-U(r)/kT], even though the adsorption process is fully irreversible. This result validates, as far as the distribution function of particles on a surface is concerned, Adamczyk's assumption [Adamczyk, Z., Zembala, M., Siwek, B. & Warszynski, P. (1990) J. Colloid Interface Sci. 140, 123-137] that the adhesion process of Brownian particles can be modeled by a random sequential adsorption model with an adsorption probability equal to exp[-U(r)/kT].