Abstract
A substrate with microstructure can increase the light extraction efficiency of OLEDs. However, the present preparation methods for micro- and nanostructures are not suited for broad-area manufacturing. In this research, we suggested an electrochemical etching approach to patterning Si substrates and effectively generated a vast area of micro-/nanostructures on the surface of Si. We created OLEDs using this patterned substrate. It was discovered through this study that when the current density is 100 mA/cm(2), the brightness increases by 1.67 times and the efficiency increases by 1.43 times, over a planar equivalent. In the future, this electrochemical etching process for patterned silicon substrates might give rise to a new approach to the large-scale manufacture of microstructured silicon substrates.