Abstract
Spin-transfer torque magnetic random-access memory (STT-MRAM) has several desirable features, such as non-volatility, high integration density, and near-zero leakage power. However, it is challenging to adopt STT-MRAM in a wide range of memory applications owing to the long write latency and a tradeoff between read stability and write ability. To mitigate these issues, an STT-MRAM bit cell can be designed with two transistors to support multiple ports, as well as the independent optimization of read stability and write ability. The multi-port STT-MRAM, however, is achieved at the expense of a higher area requirement due to an additional transistor per cell. In this work, we propose an area-efficient design of 1R/1W dual-port STT-MRAM that shares a bitline between two adjacent bit cells. We identify that the bitline sharing may cause simultaneous access conflicts, which can be effectively alleviated by using the bit-interleaving architecture with a long interleaving distance and the sufficient number of word lines per memory bank. We report various metrics of the proposed design based on the bit cell design using a 45 nm process. Compared to a standard single-port STT-MRAM, the proposed design shows a 15% lower read power and a 19% higher read-disturb margin. Compared with prior work on the 1R/1W dual-port STT-MRAM, the proposed design improves the area by 25%.