Abstract
To address the demand for laser beam-shaping techniques, we developed a one-step exposure process based on moving-mask lithography for the fabrication of a continuous-surface diffractive optical element (DOE) for laser beam shaping. The fabrication process is described in detail, and the influence of key parameters, such as pre-baking conditions, exposure gaps, development conditions, and post-baking conditions, of the lithography process on the microstructure profile of the DOE is analyzed. The reliability of the preparation method was verified through optical performance experiments. The speckle contrast, uniformity, and diffraction efficiency of the prepared linear beam-shaping element are 4.2%, 97.3%, and 87%.