Abstract
NOR/AND flash memory was studied in neuromorphic systems to perform vector-by-matrix multiplication (VMM) by summing the current. Because the size of NOR/AND cells exceeds those of other memristor synaptic devices, we proposed a 3D AND-type stacked array to reduce the cell size. Through a tilted implantation method, the conformal sources and drains of each cell could be formed, with confirmation by a technology computer aided design (TCAD) simulation. In addition, the cell-to-cell variation due to the etch slope could be eliminated by controlling the deposition thickness of the cells. The suggested array can be beneficial in simple program/inhibit schemes given its use of Fowler-Nordheim (FN) tunneling because the drain lines and source lines are parallel. Therefore, the conductance of each synaptic device can be updated at low power level.