Influence of silicon morphology on direct current plasma electrolytic oxidation process in AlSi10Mg alloy produced with laser powder bed fusion

硅形态对激光粉末床熔合制备AlSi10Mg合金直流等离子体电解氧化过程的影响

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作者:L Pezzato, C Gennari, M Franceschi, K Brunelli

Abstract

In this work, plasma electrolytic oxidation (PEO) process was applied on AlSi10Mg samples, produced with laser powder bed fusion (L-PBF), in the as printed condition and after different heat treatments, and, for comparison, on as-cast samples of AlSi10Mg. PEO process was performed in direct-current mode using high current densities and short time in a basic silicate electrolyte. For the first time, the effects of silicon morphology in L-PBF AlSi10Mg samples, in as printed condition and after different heat treatments, on the obtained PEO coating were investigated in terms of microstructure and corrosion properties. The microstructure of the substrate was characterized with optical and electron microscopy observations (optical microscopy OM, scanning electron microscopy SEM, and transmission electron microscopy TEM) and with X-ray diffraction (XRD). The analysis showed that heat treatments of annealing and solution treating modified the morphology and distribution of silicon in the samples obtained through L-PBF. The PEO coated samples were characterized with SEM, both on the surface and in the cross-section, and compositional analysis were performed with energy dispersive spectroscopy (EDS) analysis and elemental mapping. The coatings were also analyzed with XRD and the corrosion properties evaluated through electrochemical impedance spectroscopy (EIS) tests. Also microhardness tests were performed on the substrates and on the coatings. The microstructure of the coatings was strongly influenced by the silicon distribution. In particular, a non-uniform distribution of silicon and the presence of iron-rich intermetallic (obtained in the as-cast and solution treated samples) induced the formation of more porous and thinner coatings in comparison with the ones obtained in the as printed and annealed samples. The not-uniform silicon distribution produced a not-homogenous distribution of silicon into the coatings. The particular cellular structure of the as printed sample induced the formation of a coating with a higher amorphous fraction, in comparison with the ones produced on the other samples. The higher thickness and lower porosity of the coatings obtained on the annealed and as printed samples resulted in an increase of the corrosion resistance.

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