Abstract
Engineered microsphere possesses the advantage of strong light manipulation at sub-wavelength scale and emerges as a promising candidate to shrink the focal spot size. Here we demonstrated a center-covered engineered microsphere which can adjust the transverse component of the incident beam and achieve a sharp photonic nanojet. Modification of the beam width and working distance of the photonic nanojet were achieved by tuning the cover ratio of the engineered microsphere, leading to a sharp spot size which exceeded the optical diffraction limit. At a wavelength of 633 nm, a focal spot of 245 nm (0.387 λ) was achieved experimentally under plane wave illumination. Strong localized field with Bessel-like distribution was demonstrated by employing the linearly polarized beam and a center-covered mask being engineered on the microsphere.