NH(3)-Induced In Situ Etching Strategy Derived 3D-Interconnected Porous MXene/Carbon Dots Films for High Performance Flexible Supercapacitors

NH(3)诱导原位刻蚀策略制备三维互连多孔MXene/碳点薄膜用于高性能柔性超级电容器

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Abstract

2D MXene (Ti(3)CNT(x)) has been considered as the most promising electrode material for flexible supercapacitors owing to its metallic conductivity, ultra-high capacitance, and excellent flexibility. However, it suffers from a severe restacking problem during the electrode fabrication process, limiting the ion transport kinetics and the accessibility of ions in the electrodes, especially in the direction normal to the electrode surface. Herein, we report a NH(3)-induced in situ etching strategy to fabricate 3D-interconnected porous MXene/carbon dots (p-MC) films for high-performance flexible supercapacitor. The pre-intercalated carbon dots (CDs) first prevent the restacking of MXene to expose more inner electrochemical active sites. The partially decomposed CDs generate NH(3) for in situ etching of MXene nanosheets toward 3D-interconnected p-MC films. Benefiting from the structural merits and the 3D-interconnected ionic transmission channels, p-MC film electrodes achieve excellent gravimetric capacitance (688.9 F g(-1) at 2 A g(-1)) and superior rate capability. Moreover, the optimized p-MC electrode is assembled into an asymmetric solid-state flexible supercapacitor with high energy density and superior cycling stability, demonstrating the great promise of p-MC electrode for practical applications.

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