A Bench-Stable, Single-Component Precatalyst for Silyl-Heck Reactions

一种稳定性良好的单组分硅基-Heck反应预催化剂

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Abstract

Studies of the silyl-Heck reaction aimed at identifying active palladium complexes have revealed a new species that is formed in situ. This complex has been identified as the palladium iodide dimer, [(JessePhos)PdI(2)](2), which has been found to be a competent single-component precatalyst for the silyl-Heck reaction. This complex is easily prepared and is temperature, moisture, and air stable. Additionally, this precatalyst provides higher activity and greater reproducibility compared to previous systems.

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