MnO/ZnO:Zn Thin-Film Frequency Adaptive Heterostructure for Future Sustainable Memristive Systems

用于未来可持续忆阻系统的MnO/ZnO:Zn薄膜频率自适应异质结构

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Abstract

In recent years, advances in materials engineering based on adaptive electronics have found a new paradigm to optimize drawbacks in signal processing. A two-layer MnO/ZnO:Zn heterostructure envisioned for frequency adaptive electronic signal processing is synthesized by sputtering, where the use of internal states allows reconfigurability to obtain new operating modes at different frequency input signals. X-ray diffraction (XRD) analysis is performed on each layer, revealing a cubic structure for MnO and a hexagonal structure for ZnO:Zn with preferential growth in [111] and [002] directions, respectively. Scanning electron microscope (SEM) micrographs show that the surface of both materials is homogeneous and smooth. The thickness for each layer is determined to be approximately 106.3 nm for MnO, 119.3 nm for ZnO:Zn and 224.1 nm for the MnO/ZnO:Zn structure. An electrical characterisation with an oscilloscope and signal generator was carried out to obtain the time-response signals and current-voltage (I-V) curves, where no degradation is detected when changing frequencies within the range of 100 Hz to 1 MHz. An equivalent circuit is proposed to explain the effects in the interface. Measurements of switching speeds from high resistance state (HRS) to low resistance state (LRS) at approximately 17 ns, highlight the device's rapid adaptability, and an estimated switching ratio of approximately 2 × 10(4) indicates its efficiency as a memristive component. Finally, the MnO/ZnO:Zn heterojunction delivers states that are stable, repeatable, and reproducible, demonstrating how the interaction of the materials can be utilised in adaptive device applications by applying frequencies and internal states to create new and innovative design schematics, thus reducing the number of components/connections in a system for future sustainable electronics.

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