Origin of radiation tolerance in amorphous Ge(2)Sb(2)Te(5) phase-change random-access memory material

非晶态Ge(2)Sb(2)Te(5)相变随机存取存储器材料的抗辐射性能起源

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Abstract

The radiation hardness of amorphous Ge(2)Sb(2)Te(5) phase-change random-access memory material has been elucidated by ab initio molecular-dynamics simulations. Ionizing radiation events have been modeled to investigate their effect on the atomic and electronic structure of the glass. Investigation of the short- and medium-range order highlights a structural recovery of the amorphous network after exposure to the high-energy events modeled in this study. Analysis of the modeled glasses reveals specific structural rearrangements in the local atomic geometry of the glass, as well as an increase in the formation of large shortest-path rings. The electronic structure of the modeled system is not significantly affected by the ionizing radiation events, since negligible differences have been observed before and after irradiation. These results provide a detailed insight into the atomistic structure of amorphous Ge(2)Sb(2)Te(5) after irradiation and demonstrate the radiation hardness of the glass matrix.

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