Preparation and application of Ag plasmon Bi(3)O(4)Cl photocatalyst for removal of emerging contaminants under visible light

制备和应用Ag等离子体Bi(3)O(4)Cl光催化剂去除可见光下的新兴污染物

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Abstract

Photocatalytic degradation has been extensively investigated toward the removal emerging contaminants (ECs) from water. In this study, a series of Ag-Bi(3)O(4)Cl plasmon photocatalysts were synthesized through the photo-deposition of metallic Ag on the Bi(3)O(4)Cl surface. The effects of plasmon modification on the catalytic performance of bismuth oxychlorides were analyzed. Ag addition did not alter the morphology of Bi(3)O(4)Cl. With the increasing Ag content, the number of oxygen defects on the catalyst surface first increased and then decreased. Moreover, the surface plasmon resonance effect of Ag suppressed the recombination of electron-hole pairs, promoting the migration and separation of photocarriers and improving the light absorption efficiency. However, the addition of excessive Ag reduced the number of active sites on the Bi(3)O(4)Cl surface, hindering the catalytic degradation of pollutants. The optimal Ag-Bi(3)O(4)Cl photocatalyst (Ag ratio: 0.025; solution pH: 9; dosage: 0.8 g/L) achieved 93.8 and 94.9% removal of ciprofloxacin and tetrabromobisphenol A, respectively. The physicochemical and photoelectric properties of Ag-Bi(3)O(4)Cl were determined through various characterization techniques. This study demonstrates that introducing metallic Ag alters the electron transfer path of the catalyst, reduces the recombination rate of electron-hole pairs, and effectively improves the catalytic efficiency of Bi(3)O(4)Cl. Furthermore, the pathways of ciprofloxacin degradation products and their biotoxicity were revealed.

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