High Trapped Fields in C-doped MgB(2) Bulk Superconductors Fabricated by Infiltration and Growth Process

采用浸渗生长工艺制备的C掺杂MgB₂块状超导体中的高陷阱场

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Abstract

The grain boundaries in superconducting MgB(2) are known to form effective magnetic flux pinning sites and, consequently, bulk MgB(2) containing a fine-grain microstructure fabricated from nanoscale Mg and B precursor powders exhibits good magnetic field-trapping performance below 20 K. We report here that the trapped field of MgB(2) bulk superconductors fabricated by an infiltration and growth process to yield a dense, pore-free microstructure, can be enhanced significantly by carbon-doping, which increases intra-band scattering within the superconducting grains. A maximum trapped field of 4.15 T has been measured at 7.5 K at the centre of a five-sample stack of Mg(B(1-xi)C(xi))(2) bulk superconductors processed by infiltration and growth, which not only represents a ~40% increase in trapped field observed compared to undoped bulk MgB(2), but also is the highest trapped field reported to date in MgB(2) samples processed under ambient pressure. The trapped field is observed to decay at a rate of <2%/day at 10 K, which suggests that bulk MgB(2) superconductors fabricated using the infiltration and growth technique can be used potentially to generate stable, high magnetic fields for a variety of engineering applications.

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