Abstract
The Ga-doped Mg(0.2)Zn(0.8)O (GMZO) transparent semiconductor thin films were prepared using the sol-gel and spin-coating deposition technique. Changes in the microstructural features, optical parameters, and electrical characteristics of sol-gel-synthesized Mg(0.2)Zn(0.8)O (MZO) thin films affected by the amount of Ga dopants (0-5 at%) were studied. The results of grazing incidence X-ray diffraction (GIXRD) examination showed that all as-prepared MZO-based thin films had a wurtzite-type structure and hexagonal phase, and the incorporation of Ga ions into the MZO nanocrystals refined the microstructure and reduced the average crystallite size and flatness of surface roughness. Each glass/oxide thin film sample exhibited a higher average transmittance than 91.5% and a lower average reflectance than 9.1% in the visible range spectrum. Experimental results revealed that the optical bandgap energy of the GMZO thin films was slightly higher than that of the MZO thin film; the Urbach energy became wider with increasing Ga doping level. It was found that the 2 at% and 3 at% Ga-doped MZO thin films had better electrical properties than the undoped and 5 at% Ga-doped MZO thin films.