Circular Photogalvanic Current in Ni-Doped Cd(3)As(2) Films Epitaxied on GaAs(111)B Substrate

在GaAs(111)B衬底上外延生长的Ni掺杂Cd(3)As(2)薄膜中的圆形光电电流

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Abstract

Magnetic element doped Cd(3)As(2) Dirac semimetal has attracted great attention for revealing the novel quantum phenomena and infrared opto-electronic applications. In this work, the circular photogalvanic effect (CPGE) was investigated at various temperatures for the Ni-doped Cd(3)As(2) films which were grown on GaAs(111)B substrate by molecular beam epitaxy. The CPGE current generation was found to originate from the structural symmetry breaking induced by the lattice strain and magnetic doping in the Ni-doped Cd(3)As(2) films, similar to that in the undoped ones. However, the CPGE current generated in the Ni-doped Cd(3)As(2) films was approximately two orders of magnitude smaller than that in the undoped one under the same experimental conditions and exhibited a complex temperature variation. While the CPGE current in the undoped film showed a general increase with rising temperature. The greatly reduced CPGE current generation efficiency and its complex variation with temperature in the Ni-doped Cd(3)As(2) films was discussed to result from the efficient capture of photo-generated carriers by the deep-level magnetic impurity bands and enhanced momentum relaxation caused by additional strong impurity scattering when magnetic dopants were introduced.

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